Resist underlayer composition and method for forming pattern using same

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United States of America Patent

PATENT NO 9416296
APP PUB NO 20160053132A1
SERIAL NO

14779769

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Abstract

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An under-layer composition of resist having superior thermal stability, etching resistance, gap-filling property and void-preventing property, and a method for forming pattern using the same are disclosed. The under-layer composition of resist comprises: an aromatic ring containing polymer having the repeating unit of the following Formula 1; a compound of the following Formula 4; and an organic solvent.

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Patent Owner(s)

Patent OwnerAddress
DONGJIN SEMICHEM CO LTDINCHON SOUTH KOREA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Jae Hyun Seoul, KR 259 2059
Kim, Jong-Won Gyeonggi-do, KR 73 699
Lee, Jae Woo Gyeonggi-do, KR 105 611
Lee, Jung-Youl Gyeonggi-do, KR 13 92
Lim, Young Bae Gyeonggi-do, KR 2 4

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