Resin composition for optical stereolithography
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United States of America Patent
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Aug 16, 2016
Grant Date -
Jun 11, 2015
app pub date -
May 16, 2013
filing date -
May 18, 2012
priority date (Note) -
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Abstract
A resin composition for optical stereolithography including a cation-polymerizable organic compound (A), a radical polymerizable organic compound (B), a cationic polymerization initiator (C) and a radical polymerization initiator (D), wherein the cationic polymerization initiator (C) is an aromatic sulfonium compound (C-1) represented by the following general formula (C-1):
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International Classification(s)
- C08G:MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN B....
- B29C:SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTAN....
- C09D:COATING COMPOSITIONS, e.g. PAINTS, VARNISHES, LACQ....
- G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....
- C08L:COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08K:USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUB....
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