Photo-masks for lithography

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United States of America Patent

PATENT NO 9411222
SERIAL NO

14676460

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Abstract

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A photo-mask for use in extreme ultraviolet (EUV) lithography, in which the photo-mask has low coefficient of thermal expansion and high specific stiffness.

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Patent Owner(s)

  • ZYGO CORPORATION

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  • 2015 Application Filing Year
  • G21K Class
  • 287 Applications Filed
  • 220 Patents Issued To-Date
  • 76.66 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20152016201720182019202020212022202320240255075100

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Inventor Name Address # of filed Patents Total Citations
Tricard, Marc Glastonbury, US 2 29

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges2818235105311101 - 1011 - 2021 - 3031 - 4041 - 5051 - 6081 - 9091 - 1000102030405060708090100110120130140150160170180190200

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