Polishing apparatus and polishing method
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United States of America Patent
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Aug 9, 2016
Grant Date -
Jun 12, 2014
app pub date -
Oct 30, 2013
filing date -
Oct 31, 2012
priority date (Note) -
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status (Latency Note)
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Abstract
A polishing apparatus includes: a rotatable polishing table for supporting a polishing pad having a polishing surface; a top ring head having a top ring; a top ring head cover surrounding the top ring head; a dresser head having a dresser configured to dress the polishing surface; a dresser head cover surrounding the dresser head; a spray nozzle configured to spray a cleaning liquid onto an upper surface of the top ring and an outer surface of the top ring head cover when the top ring is in the substrate transfer position; and a spray nozzle configured to spray a cleaning liquid onto an outer surface of the dresser head cover when the dresser is in the retreated position.
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