Polishing composition for edge roll-off improvement

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United States of America Patent

PATENT NO 9401104
APP PUB NO 20150315417A1
SERIAL NO

14269622

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Abstract

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The invention provides a chemical-mechanical polishing composition including (a) an abrasive comprising wet-process silica particles, (b) a water-soluble polymer, (c) an oxidizing agent, (d) a chelating agent, (e) a pH-adjusting agent, and (f) an aqueous carrier, wherein the pH of the polishing composition is about 1 to about 7. The invention also provides a method of polishing a substrate, especially a nickel-phosphorus substrate, with the polishing composition.

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Patent Owner(s)

Patent OwnerAddress
CMC MATERIALS LLC1209 ORANGE STREET WILMINGTON DE 19801

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lau, Hon Wu Aurora, US 5 8
White, Michael Ridgefield, US 218 6838

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