Lithography illumination system
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United States of America Patent
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Jul 26, 2016
Grant Date -
Oct 8, 2015
app pub date -
Jun 19, 2015
filing date -
Jan 25, 2013
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Abstract
A lithography illumination system, along the transmission direction of the laser light, successively having a laser light source, a collimating and expanding unit, a pupil shaping unit, a first micro-lens array, a micro-integrator rod array, a micro-scanning slit array, a second micro-lens array, a condenser lens group, a mask, and and a motion control unit for controlling the motion of the micro scanning slit array.
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