Apparatus and method for cleaning photomask

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United States of America Patent

PATENT NO 9400425
SERIAL NO

14255557

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Abstract

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This invention relates to an apparatus and method for cleaning a photomask. This apparatus, suitable for use in removing an adhesive residue from a photomask, includes a photomask disposed such that a surface thereof on which an adhesive residue is left behind is directed downwards, a metal plate formed adjacent to the adhesive residue, and a laser generator for irradiating a laser onto the metal plate so that the adhesive residue is removed by heat generated from the metal plate.

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Patent Owner(s)

Patent OwnerAddress
AP SYSTEMS INCSOUTH CHINA GYEONGGI DO CITY EAST BEACH SURFACE EAST BEACH PRODUCTION GROUP 8 PASSES 15-5 (POSTAL CODE 18487) HWASEONG GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cho, Min Young Gyeonggi-Do, KR 7 18
Kwak, Sung Ho Gyeonggi-Do, KR 17 30

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