Deposition apparatus and deposition method
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United States of America Patent
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Jul 26, 2016
Grant Date -
Aug 1, 2013
app pub date -
Jan 28, 2013
filing date -
Jan 30, 2012
priority date (Note) -
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Abstract
A deposition apparatus according to an exemplary embodiment of the present invention includes a plurality of reactors; a plurality of gas supply units connected to the plurality of reactors; and a plurality of plasma supply units connected to the plurality of reactors. Each of the plasma supply units includes: a plasma power supplier; a plurality of diodes connected to the plasma power supplier; and a reverse voltage driver connected to the plurality of diodes through respectively corresponding switches.
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