Semiconductor processing reactor and components thereof
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United States of America Patent
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Jul 19, 2016
Grant Date -
Dec 9, 2010
app pub date -
Apr 5, 2010
filing date -
Apr 6, 2009
priority date (Note) -
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Abstract
A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber.
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