Aligning and focusing an electron beam in an X-ray source
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United States of America Patent
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Jun 28, 2016
Issued Date -
N/A
app pub date -
Dec 21, 2011
filing date -
Dec 22, 2010
priority date (Note) -
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Abstract
A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.
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Cited Art Landscape
Patent Citation Ranking
- 3 Citation Count
- H01J Class
- 20.76 % this patent is cited more than
- 9 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Dec 28, 2027 |
