Electrical resistance measurement apparatus and electrical resistance measurement method
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United States of America Patent
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Jun 21, 2016
Grant Date -
Sep 26, 2013
app pub date -
Mar 6, 2013
filing date -
Mar 21, 2012
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Abstract
An electrical resistance measurement apparatus includes a light irradiation unit that irradiates a conductive thin film with terahertz light, a reflection light detection unit that detects reflection light from the conductive thin film, and a computer containing a storage that stores correlation between the reflectance of the terahertz light from the conductive thin film and electrical resistance of the conductive thin film. The computer further containing a processor that determines, reflectance of the terahertz light from the conductive thin film based on a result of detection performed by the reflection light detection unit, and determines the electrical resistance of the conductive thin film based on the correlation and a result of the determination of the reflectance.
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