Method for structuring a surface by means of ion-beam etching, structured surface and uses

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United States of America Patent

PATENT NO 9371250
APP PUB NO 20120288676A1
SERIAL NO

13513117

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Abstract

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A process for forming an array of irregularities or features that are submicron-size in height and that have a characteristic lateral dimension that is micron- or submicron-size, over a surface of a material, by ion erosion, the process including: supplying the material with a thickness at least equal to 100 nm, the material being a solid hybrid material that includes: a simple oxide or a mixed oxide of one or more elements, an oxide molar percentage in the material being at least 40%; and a species, of a different nature to the one or more elements of the oxide, a molar percentage of the species in the material ranging from 6 mol % up to 50 mol % while remaining below the percentage of the oxide, most of the species having a largest characteristic dimension smaller than 50 nm, optionally heating the hybrid material before the erosion; structuring the surface of the hybrid material with an erosion that lasts less than one hour over an erosion area greater than 1 cm2, until the array of features is formed, the structuring optionally being accompanied by heating of the hybrid material.

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Patent Owner(s)

Patent OwnerAddress
SAINT-GOBAIN GLASS FRANCEKOLB WATT FRANCE COURBEVOIE HAUTS-DE-SEINE

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Barthel, Etienne Bourg la Reine, FR 7 61
Le, Roy Sébastien Pantin, FR 3 29
Letailleur, Alban Paris, FR 9 46
Magne, Constance Paris, FR 9 35
Sondergard, Elin Cachan, FR 6 92

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