Inspection system by charged particle beam and method of manufacturing devices using the system
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jun 14, 2016
Grant Date -
Oct 30, 2014
app pub date -
Jun 30, 2014
filing date -
Jun 27, 2000
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical systems; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2014 Application Filing Year
- H01J Class
- 2291 Applications Filed
- 1924 Patents Issued To-Date
- 83.99 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 20 Citation Count
- H01J Class
- 84.33 % this patent is cited more than
- 9 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Dec 14, 2027 |
