Self-assemblable polymer and methods for use in lithography
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United States of America Patent
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Jun 14, 2016
Grant Date -
Dec 11, 2014
app pub date -
Jan 15, 2013
filing date -
Jan 20, 2012
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Abstract
A method and system to analyze various dimensional parameters of a structure, such as a self-assembled block copolymer structure whether formed by graphoepitaxy or chemical epitaxy. The method involves image processing including median filtering and feature detection to determine critical dimension information, and optionally the use of a Hough transform to find periodicity values and to determine placement errors.
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