Photoresist stripping composition for manufacturing LCD
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United States of America Patent
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Jun 7, 2016
Grant Date -
Dec 26, 2013
app pub date -
Aug 19, 2010
filing date -
Aug 25, 2009
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Abstract
The present invention relates to a photoresist stripping composition for all process of manufacturing LCD, more specifically to a water-borne united photoresist stripping composition, as a weak basic composite comprising a tertiary alkanolamine, water, and an organic solvent. The composition according to the present invention prevents a corrosion of Al and Cu metal wiring in process of manufacturing LCD, has a good capability of removing photoresist, and is applied to all Al process, Cu process, an organic film process, and COA process.
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