Diazadiene-based metal compound, method for preparing same and method for forming a thin film using same
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United States of America Patent
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May 31, 2016
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Sep 26, 2013
app pub date -
Nov 17, 2011
filing date -
Nov 17, 2010
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Abstract
The present invention relates to a diazadiene (DAD)-based metal compound, to a method for preparing the same and to a method for forming a thin film using the same. The diazadiene (DAD)-based metal compound of the present invention is provided in a gaseous state to be formed into a metal thin film or a metal oxide thin film by chemical vapor deposition or atomic layer deposition. Particularly, the diazadiene-based organic metal compound of the present invention has advantages in that it may be formed into a metal thin film or a metal oxide thin film and it can be prepared in a relatively inexpensive way without using highly toxic ligands.
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