Ruthenium complex, method for producing same, and method for producing ruthenium-containing thin film

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United States of America Patent

PATENT NO 9349601
APP PUB NO 20150303063A1
SERIAL NO

14650274

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Abstract

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The present invention is to provide a ruthenium complex represented by formula (1a), (2), (3), etc., which is useful for producing a ruthenium-containing thin film both under the conditions using an oxidizing gas as the reaction gas and under the conditions using a reducing gas as the reaction gas:

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Patent Owner(s)

Patent OwnerAddress
TOSOH CORPORATIONYAMAGUCHI 746-8501
SAGAMI CHEMICAL RESEARCH INSTITUTE2743-1 HAYAKAWA AYASE-SHI KANAGAWA 252-1193

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chiba, Hirokazu Kanagawa, JP 7 15
Iwanaga, Kohei Kanagawa, JP 9 27
Kawano, Kazuhisa Kanagawa, JP 6 84
Maniwa, Atsushi Kanagawa, JP 5 12
Oike, Hiroyuki Kanagawa, JP 4 3
Tada, Kenichi Kanagawa, JP 5 53
Yamamoto, Toshiki Kanagawa, JP 12 123

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