Reflective photomask blank, reflective photomask, and integrated circuit device manufactured by using reflective photomask
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United States of America Patent
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May 17, 2016
Grant Date -
Feb 5, 2015
app pub date -
Jul 21, 2014
filing date -
Aug 1, 2013
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Abstract
A reflective photomask blank, a reflective photomask and an integrated circuit device manufactured by using a reflective photomask, include a multi-layered reflection layer; a capping layer on the multi-layered reflection layer and including a first transition metal; a passivation film contacting at least a portion of the capping layer on a side opposite to the multi-layered reflection layer and including a second transition metal and a nitrogen (N) atom; and a light absorption pattern covering a portion of the capping layer.
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