Method and system for forming a pattern on a reticle using charged particle beam lithography
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United States of America Patent
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May 17, 2016
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Feb 11, 2014
filing date -
Sep 1, 2008
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Abstract
A method and system for fracturing or mask data preparation is disclosed in which a desired substrate pattern for a substrate is input. A plurality of charged particle beam shots is then determined which will form a reticle pattern on a reticle, where the reticle pattern will produce a substrate pattern on the substrate using an optical lithography process, wherein the substrate pattern is within a predetermined tolerance of the desired substrate pattern. A similar method and a similar system for forming a pattern on a reticle are also disclosed.
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