Photosensitive resin composition and black spacer using the same

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United States of America Patent

PATENT NO 9334399
APP PUB NO 20140163131A1
SERIAL NO

14064325

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Abstract

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Disclosed are a photosensitive resin composition including (A) a thermally curing initiator having a half-life of about one hour at a temperature ranging from about 100 to about 150° C.; (B) a photopolymerization initiator; (C) a binder resin; (D) a photopolymerizable compound; (E) a colorant; and (F) a solvent, and a black spacer using the same.

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Patent Owner(s)

Patent OwnerAddress
CHEIL INDUSTRIES INCGYEONGBUK SOUTH KOREA

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ahn, Kyung-Won Uiwang-si, KR 8 17
Cheon, Hwan-Sung Uiwang-si, KR 44 240
Choi, Hyun-Moo Uiwang-si, KR 12 30
Jung, Ju-Ho Uiwang-si, KR 11 28
Kim, Ji-Hye Uiwang-si, KR 75 519
Yim, Jae-Bum Uiwang-si, KR 5 9
Yu, A-Rum Uiwang-si, KR 4 6

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