Processing liquid for suppressing pattern collapse of fine metal structure and method for producing fine metal structure using same
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United States of America Patent
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May 10, 2016
Grant Date -
Jul 19, 2012
app pub date -
Sep 29, 2010
filing date -
Oct 2, 2009
priority date (Note) -
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Abstract
There are provided a processing liquid for suppressing pattern collapse of a fine metal structure, containing at least one member selected from an imidazolium halide having an alkyl group containing 12, 14 or 16 carbon atoms, a pyridinium halide having an alkyl group containing 14 or 16 carbon atoms, an ammonium halide having an alkyl group containing 14, 16 or 18 carbon atoms, a betaine compound having an alkyl group containing 12, 14 or 16 carbon atoms, and an amine oxide compound having an alkyl group containing 14, 16 or 18 carbon atoms, and a method for producing a fine metal structure using the same.
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International Classification(s)
- C09K:MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED ....
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- B81C:PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE M....
- H01B:CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATER....
- C23G:CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CH....
- B44C:PRODUCING DECORATIVE EFFECTS
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