Plasma treatment device
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United States of America Patent
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May 10, 2016
Grant Date -
Jul 23, 2009
app pub date -
Sep 21, 2006
filing date -
Oct 28, 2005
priority date (Note) -
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Abstract
A plasma abatement device comprises a gas chamber having a gas inlet for receiving a gas to be treated by the device and a gas outlet, at least part of the inner surface of the gas chamber being formed from, or coated with, an electrically conductive material that is resistant to corrosion during treatment of a gas containing a halocompound and water vapor.
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