Grid refinement method

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United States of America Patent

PATENT NO 9329488
SERIAL NO

14928810

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Abstract

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The present disclosure provides an embodiment of a method, for a lithography process for reducing a critical dimension (CD) by a factor n wherein n<1. The method includes providing a pattern generator having a first pixel size S1 to generate an alternating data grid having a second pixel size S2 that is 1, wherein the pattern generator includes multiple grid segments configured to offset from each other in a first direction; and scanning the pattern generator in a second direction perpendicular to the first direction during the lithography process such that each subsequent segment of the grid segments is controlled to have a time delay relative to a preceding segment of the grid segments.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANAGEMENT COMPANY LTDNO 8 LI-HSIN ROAD 6 SCIENCE-BASED INDUSTRIAL PARK HSIN-CHU 300-77

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lin, Burn Jeng Hsinchu, TW 127 3214
Lin, Shy-Jay Jhudong Township, TW 142 982
Liu, Pei-Yi Changhua, TW 31 262
Shin, Jaw-Jung Hsinchu, TW 43 731
Wang, Wen-Chuan Hsinchu, TW 73 508

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