Machine and method for atmospheric plasma treatment of continuous substrates
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United States of America Patent
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Apr 26, 2016
Grant Date -
Nov 22, 2012
app pub date -
Jan 31, 2011
filing date -
Feb 2, 2010
priority date (Note) -
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Abstract
A machine for atmospheric plasma treatment of continuous material substrates comprises means for feeding a substrate for moving it along a feed path; at least two electrodes each positioned at one face of the substrate, each electrode facing a respective face of the substrate, a difference in electric potential being applicable across the electrodes for generating an electric discharge; the feed means comprising at least one first roller and one second roller, the first roller and the second roller coinciding with respective electrodes and each acting on a respective face of the substrate.
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International Classification(s)
- H01J:ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....
- B05D:PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MAT....
- B29C:SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTAN....
- D06B:TREATING TEXTILE MATERIALS BY LIQUIDS, GASES, OR V....
- B01J:CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, CO....
- H05H:PLASMA TECHNIQUE
- D06M:TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D0....
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