Fluorene oxime ester compound, photopolymerization initiator and photoresist composition containing the same

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United States of America Patent

PATENT NO 9316906
APP PUB NO 20150111152A1
SERIAL NO

14398565

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Abstract

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Provided are a novel fluorene oxime ester compound, and a photopolymerization initiator and a photoresist composition containing the same.

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Patent Owner(s)

Patent OwnerAddress
KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGYDAEJEON KOREA DAEJEON
SAMYANG CORPORATION31 JONG-RO 33-GIL JONGNO-GU SEOUL 03129 03129

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
An, Kyoung Lyong Daejeon, KR 2 17
Choi, Anam Jinju-si, KR 1 16
Jun, Kun Daejeon, KR 7 25
Lee, Sang Oh Mokpo-si, KR 8 32
Moon, Bong Seok Daejeon, KR 14 58
Oh, Chunrim Seoul, KR 1 16
Park, Soo Youl Daejeon, KR 2 36
Shin, Jong Il Daejeon, KR 21 122
Shin, Seung Rim Daejeon, KR 8 18
So, In-Young Chungcheongnam-do, KR 1 16

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