Hydrogen surface-treated graphene, formation method thereof and electronic device comprising the same

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United States of America Patent

PATENT NO 9315389
APP PUB NO 20150110706A1
SERIAL NO

14516746

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Abstract

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The present invention relates to hydrogen surface-treated graphene, a formation method thereof, and an electronic device including the same. The graphene according to one exemplary embodiment of the present invention can be useful in preparing hydrogen surface-treated graphene having a band gap using simple methods through indirect hydrogen plasma treatment. Also, the graphene according to one exemplary embodiment of the present invention can be useful in forming two regions having different band gaps through the indirect hydrogen plasma treatment, and thus can be useful in reducing the processing time and the processing cost since the graphene is directly applicable to electronic devices such as transistors, and touch panels.

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Patent Owner(s)

Patent OwnerAddress
UNIVERSITY-INDUSTRY FOUNDATION YONSEI UNIVERSITY50 YONSEI-RO SEODAEMUN-GU SEOUL 03722

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hong, Jongill Seoul, KR 14 55
Son, Jangyup Gyeonggi-do, KR 2 0

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