Method for synthesis and formation of a digital hologram for use in microlithography
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United States of America Patent
Stats
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Apr 12, 2016
Grant Date -
Jul 2, 2015
app pub date -
Dec 28, 2013
filing date -
Dec 28, 2013
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The invention describes a method of manufacturing a holographic mask capable of producing an image pattern that contains elements of a sub-wavelength size along with decreased deviations from the original pattern. The original pattern is converted into a virtual electromagnetic field and is divided into a set of virtual cells with certain amplitudes and phases, which are mathematically processed for obtaining the virtual digital hologram. The calculation of the latter is based on parameters of the restoration wave, which is used to produce the image pattern from the mask, and on computer optimization by variation of amplitudes and phases of the set of virtual cells and/or parameters of the virtual digital hologram for reaching a satisfactory matching between the produced image pattern and the original pattern. The obtained virtual digital hologram provides physical parameters of the actual digital hologram that is to be manufactured.
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Cited Art Landscape
Patent Citation Ranking
- 6 Citation Count
- G03F Class
- 19.15 % this patent is cited more than
- 9 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Oct 12, 2027 |
