Lithographic method with the capability of spectrum engineering to create complex microstructures
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United States of America Patent
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Mar 22, 2016
Grant Date -
Aug 14, 2014
app pub date -
Aug 23, 2012
filing date -
Aug 23, 2011
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Abstract
The present invention relates to a method for microstructuring a substrate. In the method according to the invention a substrate with a region to be structured is provided, and then by applying colloid spheres into this region, a colloid sphere monolayer is formed. The thus applied colloid sphere monolayer exhibits a certain geometrical symmetry. Said colloid sphere monolayer is then illuminated with a beam of spatially modulated intensity distribution synchronized to said monolayer, thereby performing mechanical structuring in said region in conformity with a desired pattern through concentrating beam intensity via near-field effect behind said colloid sphere monolayer in the propagation direction of light.
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