Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography
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United States of America Patent
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Mar 22, 2016
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Jun 11, 2015
app pub date -
Feb 19, 2015
filing date -
Dec 25, 2009
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Abstract
A developing solution for photolithography in which tetrabutylammonium hydroxide (TBAH) is used as an alkaline agent of the developing solution and deposition of TBAH is suppressed. A method for producing a developing solution for photolithography capable of suppressing TBAH deposition when producing the developing solution by diluting a concentrated developing solution containing TBAH and a production apparatus used for the production method. The developing solution includes tetrabutylammonium hydroxide and at least one of a water-soluble organic solvent, a surfactant, and a clathrate compound. The temperature of the liquid is maintained at 27° C. or higher during dilution.
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