Edit guided processing method for time-lapse image analysis

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United States of America Patent

PATENT NO 9286681
APP PUB NO 20150356736A1
SERIAL NO

14297103

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Abstract

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A computerized mask edit guided processing method for time-lapse image analysis performs by a computer program an assisted mask editing on an input image sequence to generate mask edit data, and performs a mask edit guided processing using the image sequence and the mask edit data. A computerized track edit guided processing method for time-lapse image analysis performs by a computer program an assisted track editing on an input image sequence to generate track edit data, and performs a track edit guided processing using the image sequence and the track edit data. A computerized edit guided processing method for time-lapse image analysis performs by a computer program a combination of assisted mask editing and assisted track editing on an input image sequence to generate edit data, and performs a combination of mask edit guided processing and track edit guided processing using the image sequence and the edit data.

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LEICA MICROSYSTEMS CMS GMBH35578 WETZLAR

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  • 2014 Application Filing Year
  • G06T Class
  • 7320 Applications Filed
  • 5464 Patents Issued To-Date
  • 74.65 % Issued To-Date
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Inventor Name Address # of filed Patents Total Citations
Graff, Bryce Kirkland, US 1 0
Jones, Michael William Normandy Park, US 5 129
Lee, Shih-Jong James Bellevue, US 23 98

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges845061695632812351201 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 1000255075100125150175200225250275300325350375400425450475500525550

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