Self patterning plasmonic array structures
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United States of America Patent
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Mar 8, 2016
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Jul 16, 2013
filing date -
Jul 17, 2012
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Abstract
A selective area atomic layer deposition process and apparatus that can deposit conductive materials onto one homopolymer region in a diblock copolymer. The diblock copolymer generates a large area self assembled substrate with nanoscale homopolymer regions arrayed into predictable patterns. Combining these two technologies allows formation of plasmonic surfaces without expensive lithographic processing.
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