Methods of forming layers
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United States of America Patent
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Mar 1, 2016
Grant Date -
Aug 8, 2013
app pub date -
Feb 1, 2013
filing date -
Feb 3, 2012
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Abstract
A method of forming a layer, the method including providing a substrate having at least one surface adapted for deposition thereon; and directing a particle beam towards the surface of the substrate, the particle beam including moderately charged ions (MCIs), substantially all the MCIs independently have charges from ±2 to ±6 and kinetic energies of not greater than about 200 eV, wherein the MCIs do not penetrate more than about 30 Å into the surface of the substrate to form a layer on the substrate.
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