Imprint lithography apparatus and method
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United States of America Patent
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Mar 1, 2016
Grant Date -
Oct 7, 2010
app pub date -
Mar 30, 2010
filing date -
Apr 1, 2009
priority date (Note) -
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Abstract
An imprint lithography apparatus is disclosed that includes a first imprint template provided with pattern recesses and a second imprint template provided with pattern recesses, wherein the pattern recesses of the first imprint template are configured to form features on a substrate which interconnect laterally with features formed by the pattern recesses of the second imprint template, and wherein the pattern recesses of the second imprint template have a critical dimension which is three or more times greater than the critical dimension of the pattern recesses of the first imprint template.
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