Etchant product analysis in alkaline etchant solutions
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United States of America Patent
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Mar 1, 2016
Grant Date -
Jul 24, 2014
app pub date -
Jul 15, 2013
filing date -
Jan 22, 2013
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Abstract
Silicon ions in an alkaline etchant solution are analyzed by acidifying a sample of the etchant solution, adding fluoride ions in excess of the concentration required to react with all of the silicon ions, and using a fluoride ion specific electrode (FISE) to detect free fluoride ions in the resulting test solution. Good sensitivity and precision are provided by using a relatively acidic test solution and only a slight excess of fluoride ions, and limiting the analysis range to the maximum expected silicon concentration in the etchant solution.
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