Film-forming apparatus and film-forming method
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United States of America Patent
Stats
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Mar 21, 2017
Grant Date -
Dec 27, 2012
app pub date -
Jun 19, 2012
filing date -
Jun 19, 2012
priority date (Note) -
Withdrawn
status (Latency Note)
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Abstract
A film-forming apparatus and method comprising a film-forming chamber for supplying a reaction gas into, a cylindrical shaped liner provided between an inner wall of the film-forming chamber and a space for performing a film-forming process, a main-heater for heating a substrate placed inside the liner, from the bottom side, a sub-heater cluster provided between the liner and the inner wall, for heating the substrate from the top side, wherein the main-heater and the sub-heater cluster are resistive heaters, wherein the sub-heater cluster has a first sub-heater provided at the closest position to the substrate, and a second sub-heater provided above the first sub-heater, wherein the first sub-heater heats the substrate in combination with the main-heater, the second sub-heater heats the liner at a lower output than the first sub-heater, wherein each temperature of the main-heater, the first sub-heater, and the second sub-heater is individually controlled.
First Claim
Other Claims data not available
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International Classification(s)
- 2012 Application Filing Year
- C30B Class
- 390 Applications Filed
- 342 Patents Issued To-Date
- 87.70 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- C30B Class
- 0 % this patent is cited more than
- 9 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Sep 1, 2027 |