Vapor deposition apparatus and method associated
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United States of America Patent
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Mar 1, 2016
Grant Date -
Oct 1, 2015
app pub date -
Jul 11, 2012
filing date -
Apr 18, 2012
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Abstract
A vapor deposition apparatus includes a deposition chamber for carrying out a deposition of a film on a substrate, source gas tubes for supplying a source gas, a transfer unit for transferring the substrate in the interior of the deposition chamber so that the substrate is alternately situated in a state where the substrate is located in a deposition region that faces the gas discharge port for supplying the source gas and in a state where the substrate is located in other region except the deposition region, while the source gas is supplied from a gas discharge port of any one of the source gas tubes, and a supply tube for supplying a gas containing group-V element to the substrate S located in the other region.
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