System and process for determining offsets of measuring instruments
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Feb 23, 2016
Grant Date -
Jul 11, 2013
app pub date -
Sep 13, 2011
filing date -
Sep 20, 2010
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A system (1) is described for determining offsets (δ) of measuring instruments, in particular of measures with a null or constant mean value, composed of first processing means (3) adapted to compute, from at least one value of a measuring signal (S) deriving from an instantaneous measure performed by at least one measuring instrument or a sensor, at least one offset value (δ) of such signal (S); and second processing means (5) adapted to subtract such offset value (δ) from the value of the instantaneous measure signal (S) to obtain a corrected measure value (S−δ) of such signal S. A process is also described for determining offsets (δ) of measuring instruments, in particular of measures with a null or constant mean value.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully