Arc evaporation source having fast film-forming speed, coating film manufacturing method and film formation apparatus using the arc evaporation source
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United States of America Patent
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Feb 23, 2016
Grant Date -
Apr 25, 2013
app pub date -
Jun 15, 2011
filing date -
Jun 23, 2010
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Abstract
An arc evaporation source having fast film-forming speed includes: at least one circumference magnet surrounding the circumference of a target, wherein the magnetization direction of the magnet runs orthogonal to the target surface; a non-ring shaped first permanent magnet on the target's rear surface side has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the target's surface; a non-ring shaped second permanent magnet arranged either on the rear surface side of the first permanent magnet or between the first permanent magnet and the target, so as to leave a gap from the first permanent magnet, has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the surface of the target; and a magnetic body between the first permanent magnet and the second permanent magnet.
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