Method for manufacturing microstructure
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United States of America Patent
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Feb 16, 2016
Grant Date -
Mar 5, 2015
app pub date -
Aug 29, 2014
filing date -
Aug 30, 2013
priority date (Note) -
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Abstract
A method is provided for producing a microstructure. The method includes the first step of forming a supporting layer on a base substrate including a silicon substrate provided with recessed sections at a first surface thereof and a metal structure filling the recessed sections so as to come in contact with the metal structure at the first surface, the second step of forming a structure including the metal structure and the supporting layer by selectively etching the silicon substrate to expose at least the surface of the metal structure opposite the surface in contact with the supporting layer from the silicon substrate, and the third step of selectively etching the supporting layer of the metal structure.
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