Alignment of an interferometer module for use in an exposure tool

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United States of America Patent

PATENT NO 9261800
APP PUB NO 20120250030A1
SERIAL NO

13436741

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Abstract

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The invention relates to alignment of an interferometer module for use in an exposure tool. An alignment method is provided for aligning an interferometer to the tool while outside of the too. Furthermore, the invention provides a dual interferometer module, an alignment frame use in the alignment method, and an exposure tool provided with first mounting surfaces for cooperative engagement with second mounting surfaces of an interferometer module.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Couweleers, Godefridus Cornelius Antonius Delft, NL 9 47
de, Boer Guido Leerdam, NL 42 242
Ooms, Thomas Adriaan Delfgauw, NL 4 25
Vergeer, Niels Rotterdam, NL 22 152

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