Reflective lithography masks and systems and methods
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United States of America Patent
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Feb 16, 2016
Grant Date -
Nov 13, 2014
app pub date -
Jul 25, 2014
filing date -
Mar 15, 2012
priority date (Note) -
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Abstract
Various non-planar reflective lithography masks, systems using such lithography masks, and methods are disclosed. An embodiment is a lithography mask comprising a transparent substrate, a reflective material, and a reticle pattern. The transparent substrate comprises a curved surface. The reflective material adjoins the curved surface of the transparent substrate, and an interface between the reflective material and the transparent substrate is a reflective surface. The reticle pattern is on a second surface of the transparent substrate. A reflectivity of the reticle pattern is less than a reflectivity of the reflective material. Methods for forming similar lithography masks and for using similar lithography masks are disclosed.
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