Phase-shift blankmask and method for fabricating the same
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United States of America Patent
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Feb 9, 2016
Grant Date -
Oct 31, 2013
app pub date -
Apr 17, 2013
filing date -
Apr 30, 2012
priority date (Note) -
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Abstract
Provided is a phase-shift blankmask in which a phase-shift layer is formed in at least two continuous layers or a multi-layer film and an uppermost phase-shift layer included in the phase-shift layer is thinly formed to contain a small amount of oxygen (O) so as to enhance chemical resistance and durability thereof.
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