Aluminum precursor composition

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United States of America Patent

PATENT NO 9255324
APP PUB NO 20140050848A1
SERIAL NO

13966605

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Abstract

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The present disclosure is related to an aluminum-containing precursor composition, especially a precursor composition which is vaporized to be used for vapor phase deposition processes such as chemical vapor deposition (CVD) or atomic layer deposition (ALD).

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Patent Owner(s)

Patent OwnerAddress
UP CHEMICAL CO LTD81 SANDAN-RO 197BEON-GIL PYEONGTAEK-SI GYEONGGI-DO PYEONGTAEK-SI 17749

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Han, Won Seok Anseong-si, KR 44 157
Koh, Wonyong Daejeon, KR 21 1513
Park, Myeong-Ho Suwon-si, KR 6 8

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