Detection devices and methods using diffraction wavefront of a pinhole stitching measurement of surface shape

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United States of America Patent

PATENT NO 9250059
APP PUB NO 20150362308A1
SERIAL NO

14695590

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Abstract

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The present disclosure provides detection devices and methods using a diffraction wavefront of a pinhole stitching measurement of surface shape. The light emitted from the laser passes through a filter hole, a first condenser lens, a spatial filter, a beam expander, a half wave plate, a λ/4 wave plate, an attention plate and then is transmitted through a beam splitter, reflected by a reflecting mirror and is irradiated onto an pinhole through a first optical adjustable shelf and a second set of condenser lens. A part of diffraction light generated by the pinhole is irradiated to the mirror to be measured; the light reflected by the mirror to be measured is reflected by a frame of the pinhole and generate a diffraction fringe along with another part of the diffraction wavefront of the pinhole. The interference fringe is focused by the third set of condenser lens on the third optical adjustable shelf and is collected by the CCD detector. The mirror to be measured is positioned on the second optical adjustable shelf and may be moved along a normal direction of the mirror to be measured to implement an annular aperture stitching measurement. Meanwhile, the first optical adjustable shelf may be rotated and moved in translation to measure the mirror by a scanning sub apertures stitching measurement.

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Patent Owner(s)

Patent OwnerAddress
INSTITUTE OF OPTICS AND ELECTRONICS CHINESE ACADEMY OF SCIENCES610209 SHUANGLIU 350 SICHUAN CHENGDU CHENGDU CITY SICHUAN PROVINCE 610209

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jia, Xin Chengdu, CN 20 49
Xie, Weimin Chengdu, CN 3 1
Xing, Tingwen Chengdu, CN 6 6
Xu, Fuchao Chengdu, CN 5 1
Xu, Jiajun Chengdu, CN 20 12

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