Exposure method, substrate stage, exposure apparatus, and device manufacturing method
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United States of America Patent
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Feb 23, 2016
Grant Date -
Jun 6, 2013
app pub date -
Jan 30, 2013
filing date -
Jan 30, 2013
priority date (Note) -
Withdrawn
status (Latency Note)
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Abstract
An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
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