Imprint lithography template
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United States of America Patent
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Jan 5, 2016
Grant Date -
Jan 9, 2014
app pub date -
Sep 13, 2013
filing date -
Dec 10, 2009
priority date (Note) -
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Abstract
Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.
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