Ion generation method and ion source

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United States of America Patent

PATENT NO 9208983
APP PUB NO 20140062286A1
SERIAL NO

14011575

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Abstract

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An ion generation method uses a direct current discharge ion source provided with an arc chamber formed of a high melting point material, and includes: generating ions by causing molecules of a source gas to collide with thermoelectrons in the arc chamber and producing plasma discharge; and causing radicals generated in generating ions to react with a liner provided to cover an inner wall of the arc chamber at least partially. The liner is formed of a material more reactive to radicals generated as the source gas is dissociated than the material of the arc chamber.

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Patent Owner(s)

Patent OwnerAddress
SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO LTD1-1 OSAKI 2-CHOME SHINAGAWA-KU TOKYO 141-6025

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sato, Masateru Ehime, JP 18 193

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