Interference exposure device and method
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United States of America Patent
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Nov 24, 2015
Grant Date -
Jun 26, 2014
app pub date -
Aug 16, 2012
filing date -
Aug 22, 2011
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Abstract
An interference exposure device, including: a light source (100) for providing an exposure light beam; a light homogenizer-collimator (200) for homogenizing and collimating the exposure light beam; an interference unit (300) including at least two gratings (303) for converting the exposure light beam into at least two coherent light beams and making the coherent light beams converge on a substrate surface to form thereon an interference exposure pattern, the gratings (303) each having a period and being distributed in correspondence with a desired exposure pattern; a driving and supporting means (406) for supporting and carrying the substrate to move with at least three degrees of freedom; and a measuring element (500) for measuring an angle between coordinate systems of the interference unit (300) and the means (406) to adjust an exposure position of the means (406) based on a measurement result of the measuring element (500) before exposing the substrate.
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