Mask plate and exposing method
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United States of America Patent
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Nov 24, 2015
Grant Date -
Nov 7, 2013
app pub date -
Jul 3, 2013
filing date -
May 14, 2010
priority date (Note) -
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Abstract
A mask plate comprises a light transmitting region; a light absorbing region; and a light reflecting region provided in the light absorbing region on one side of the mask plate. An exposing method using the mask plate comprises placing a first substrate coated with a first photosensitive resist layer under and parallel to the mask plate; having first light vertically strike on an upper surface of the mask plate from above, pass through the light transmitting region of the mask plate, and strike on the first photosensitive resist layer; placing a second substrate coated with a second photosensitive resist layer under and parallel to the mask plate; and having second light reflected by the lens device onto the surface of the mask plate where the light reflecting region is provided, then reflected by the light reflecting region and strike on the second photosensitive resist layer.
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