Method for producing substrate having dispersed particles of dendrimer compound on the surface thereof, and substrate having dispersed particles of dendrimer compound on the surface thereof

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United States of America Patent

PATENT NO 9192994
SERIAL NO

13567926

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Abstract

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A method for producing a substrate having dispersed particles of a dendrimer compound on the surface thereof, the method including: an application step including dissolving a phenyl azomethine dendrimer compound in a solvent to prepare a solution, and applying the solution on the surface of a substrate; and a volatilization step including volatilizing the solvent from the solution applied on the surface of the substrate, the phenyl azomethine dendrimer compound included in the solution having a concentration of no greater than 5 μmol/L is employed.

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Patent Owner(s)

Patent OwnerAddress
TOKYO OHKA KOGYO CO LTD150 NAKAMARUKO NAKAHARA-KU KANAGAWA KAWASAKI-SHI 211-0012

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirano, Isao Kawasak, JP 22 59
Imaoka, Takane Tokyo, JP 4 7
Yamamoto, Kimihisa Tokyo, JP 16 73

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